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首页> 外文期刊>Physical review. B, Condensed Matter And Materals Physics >Hole spins in an InAs/GaAs quantum dot molecule subject to lateral electric fields
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Hole spins in an InAs/GaAs quantum dot molecule subject to lateral electric fields

机译:受到侧向电场作用的InAs / GaAs量子点分子中的空穴自旋

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摘要

There has been tremendous progress in manipulating electron and hole-spin states in quantum dots or quantum dot molecules (QDMs) with growth-direction (vertical) electric fields and optical excitations. However, the response of carriers in QDMs to an in-plane (lateral) electric field remains largely unexplored. We computationally explore spin-mixing interactions in the molecular states of single holes confined in vertically stacked InAs/GaAs QDMs using atomistic tight-binding simulations. We systematically investigate QDMs with different geometric structure parameters and local piezoelectric fields. We observe both a relatively large Stark shift and a change in the Zeeman splitting as the magnitude of the lateral electric field increases. Most importantly, we observe that lateral electric fields induce hole-spin mixing with a magnitude that increases with increasing lateral electric field over a moderate range. These results suggest that applied lateral electric fields could be used to fine tune and manipulate, in situ, the energy levels and spin properties of single holes confined in QDMs.
机译:在利用生长方向(垂直)电场和光激发来操纵量子点或量子点分子(QDM)中的电子和空穴自旋态方面已经取得了巨大的进步。但是,QDM中的载流子对平面(横向)电场的响应仍未开发。我们使用原子紧密结合模拟,在垂直堆叠的InAs / GaAs QDM中限制了单个孔的分子态中的自旋混合相互作用。我们系统地研究具有不同几何结构参数和局部压电场的QDM。我们观察到相对大的Stark位移和塞曼分裂的变化都随横向电场强度的增加而变化。最重要的是,我们观察到,横向电场会引起空穴-自旋混合,并且幅度在中等范围内随横向电场的增加而增加。这些结果表明,施加的横向电场可用于微调和控制QDM中单个孔的能级和自旋特性。

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  • 来源
    《Physical review. B, Condensed Matter And Materals Physics》 |2016年第24期|245402.1-245402.10|共10页
  • 作者单位

    Dept. of Physics and Astronomy, University of Delaware, Newark, Delaware 19716, USA;

    Quantum Measurement Division and Joint Quantum Institute, National Institute of Standards and Technology, 100 Bureau Drive, Stop 8423, Gaithersburg, Maryland 20899-8423, USA;

    Dept. of Physics and Astronomy, University of Delaware, Newark, Delaware 19716, USA,Dept. of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, USA;

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