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High-Q Exterior Whispering-Gallery Modes in a Double-Layer Crystalline Microdisk Resonator

机译:双层晶体微盘谐振器中的高Q外部回音壁模式

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摘要

Exterior whispering-gallery modes (WGMs), whose mode energy is mainly confined outside the microcavity, can achieve large mode overlapping with the ambient environment, as well as a strong electric field and gradient force at the surface. Here, we demonstrate highly localized WGMs in the nanoair gap of a double-layer crystalline microdisk. The geometry is based on a horizontal slot-waveguide structure of two vertically stacked crystalline microdisks made of lithium niobate thin films. The slot WGM possesses a high quality factor in excess of 10(5) without metallic loss. The absorption and scattering loss is reduced by use of the crystalline nanofilm at sub-nm rms surface roughness. The demonstrated configuration can be highly favored in various applications including optical sensing, nonlinear optics, and optomechanics.
机译:外部耳语画廊模式(WGM)的模式能量主要限制在微腔之外,可以实现与周围环境重叠的大模式,并在表面产生强电场和梯度力。在这里,我们展示了在双层晶体微盘的纳米空气间隙中高度局部化的WGM。该几何结构基于两个垂直堆叠的由铌酸锂薄膜制成的晶体微盘的水平缝隙波导结构。 WGM插槽拥有超过10(5)的高质量因子,而没有金属损失。通过使用亚纳米均方根表面粗糙度的结晶纳米膜,可以减少吸收和散射损失。在各种应用中,包括光学传感,非线性光学和光机械学,所展示的配置都将受到高度青睐。

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  • 来源
    《Physical review letters》 |2019年第25期|253902.1-253902.5|共5页
  • 作者单位

    Shanghai Jiao Tong Univ, Sch Phys & Astron, State Key Lab Adv Opt Commun Syst & Networks, Shanghai 200240, Peoples R China|Shanghai Jiao Tong Univ, Collaborat Innovat Ctr IFSA, Minist Educ, Key Lab Laser Plasma, Shanghai 200240, Peoples R China;

    East China Normal Univ, State Key Lab Precis Spect, Shanghai 200062, Peoples R China|East China Normal Univ, Sch Phys & Mat Sci, XXL Extreme Optoelectromech Lab, Shanghai 200241, Peoples R China|Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China;

    Shanghai Jiao Tong Univ, Sch Phys & Astron, State Key Lab Adv Opt Commun Syst & Networks, Shanghai 200240, Peoples R China|Shanghai Jiao Tong Univ, Collaborat Innovat Ctr IFSA, Minist Educ, Key Lab Laser Plasma, Shanghai 200240, Peoples R China;

    East China Normal Univ, State Key Lab Precis Spect, Shanghai 200062, Peoples R China|East China Normal Univ, Sch Phys & Mat Sci, XXL Extreme Optoelectromech Lab, Shanghai 200241, Peoples R China|Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China|Shanxi Univ, Collaborat Innovat Ctr Extreme Opt, Taiyuan 030006, Shanxi, Peoples R China;

    Shanghai Jiao Tong Univ, Sch Phys & Astron, State Key Lab Adv Opt Commun Syst & Networks, Shanghai 200240, Peoples R China|Shanghai Jiao Tong Univ, Collaborat Innovat Ctr IFSA, Minist Educ, Key Lab Laser Plasma, Shanghai 200240, Peoples R China;

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