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首页> 外文期刊>Physica status solidi >Green light-emitting diodes with p-lnGaN:Mg grown on c-plane sapphire and GaN substrates
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Green light-emitting diodes with p-lnGaN:Mg grown on c-plane sapphire and GaN substrates

机译:在c面蓝宝石和GaN衬底上生长具有p-InGaN:Mg的绿色发光二极管

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摘要

We report the structural, electrical, and optical characteristics of green light emitting diodes (LEDs) using InGaN:Mg as a p-type layer grown on a (0001) bulk GaN substrate in comparison to the LEDs grown on a sapphire substrate. The density of nano-pits of LEDs on the bulk substrates is significantly lower than that on the sapphire substrate by 2 orders of magnitude, resulting from the reduced dislocation density inrnbulk GaN substrates. As a result, the reverse current of LEDs grown on the bulk GaN substrates is significantly reduced as compared to that on the sapphire substrate. In contrast to the substantial improvement in electrical properties, the emission intensity of the LEDs on the bulk GaN substrate is similar to that of the LEDs on the sapphire substrate.
机译:我们报告了与在蓝宝石衬底上生长的LED相比,使用InGaN:Mg作为在(0001)大块GaN衬底上生长的p型层的绿色发光二极管(LED)的结构,电学和光学特性。块状衬底上的LED纳米凹坑的密度比蓝宝石衬底上的LED纳米凹坑的密度显着低2个数量级,这是由于InGaN GaN衬底的位错密度降低所致。结果,与在蓝宝石衬底上相比,在块状GaN衬底上生长的LED的反向电流显着减小。与电性能的显着改善相比,块状GaN衬底上的LED的发射强度类似于蓝宝石衬底上的LED的发射强度。

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  • 来源
    《Physica status solidi》 |2009年第4期|750-753|共4页
  • 作者单位

    Center for Compound Semiconductors and School of Electrical and Computer Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, GA 30332-0250, USA;

    Center for Compound Semiconductors and School of Electrical and Computer Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, GA 30332-0250, USA;

    Center for Compound Semiconductors and School of Electrical and Computer Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, GA 30332-0250, USA;

    Center for Compound Semiconductors, School of Electrical and Computer Engineering, and School of Materials Science and Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, GA 30332-0250, USA;

    Center for Compound Semiconductors and School of Electrical and Computer Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, GA 30332-0250, USA;

    Center for Compound Semiconductors, School of Electrical and Computer Engineering, and School of Materials Science and Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, GA 30332-0250, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ⅱ-Ⅵ semiconductors; quantum wells; chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.); light-emitting devices;

    机译:Ⅱ-Ⅵ半导体;量子阱化学气相沉积(包括等离子体增强CVD;MOCVD等);发光装置;

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