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机译:化学气相沉积法制备氧化铜薄膜的合成,表征和电性能
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
Physics Institute, Justus-Liebig-University Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;
copper(Ⅱ) acetylacetonate; Cu_2O; CVD; growth; characterization;
机译:脉冲液体注入等离子体增强金属有机化学气相沉积法沉积氧化钇和硅酸钇薄膜的微观结构和电学性质
机译:氟化氨基醇盐和亚氨基醇盐镓配合物的合成与表征:在Ga2O3薄膜化学气相沉积中的应用
机译:通过金属有机化学气相沉积法生长的超薄Al_2O_3薄膜的电学性质,用于先进的互补金属氧化物半导体栅极电介质应用
机译:金属氧化物的金属有机化学气相沉积:来自薄膜的前体合成
机译:通过金属有机化学气相沉积相选择合成Tl-Ba-Ca-Cu-O薄膜和多层结构。工艺优化,相变,电学表征和微结构发展。
机译:常压等离子体化学气相沉积法生长掺锌铜的抗菌氧化硅薄膜
机译:通过喷雾热解沉积获得的氧化铜薄膜的合成,表征和光学性质