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Current status and future prospects of GaN-based LEDs and LDs

机译:GaN基LED和LD的现状和未来展望

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We review the recent progress of GaN-based light emitting diodes (LEDs) and laser diodes (LDs) and discuss the availability for ultraviolet (UV) emission optoelectronic devices by using GaN related compound semiconductors. We fabricated UV LEDs and LDs with an emission wavelength of 365 nm which are useful for various industrial uses because of same wavelength as i-line of high-pressure mercury vapor lamps. Regarding UV LEDs, practical 365 nm UV LED with high efficiency was realized by optimizing device structure. For fabricating the ultraviolet LDs, we used the AlInGaN active layer instead of InGaN one. It was investigated that the relationship between the threshold current density and the lasing wavelength in the UV region. We demonstrated the shortest LDs with a lasing wavelength 365 nm under the continuous-wave operation.
机译:我们回顾了基于GaN的发光二极管(LED)和激光二极管(LD)的最新进展,并讨论了通过使用与GaN相关的化合物半导体的紫外(UV)发射光电器件的可用性。我们制造了发射波长为365 nm的UV LED和LD,这些波长与高压汞蒸气灯的i线波长相同,可用于各种工业用途。关于UV LED,通过优化器件结构实现了高效的实用365 nm UV LED。为了制造紫外LD,我们使用了AlInGaN有源层代替了InGaN有源层。研究了在UV区域中阈值电流密度与激光发射波长之间的关系。我们展示了在连续波操作下激光波长为365 nm的最短LD。

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