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Quantitative compositional analysis of quantum well intermixing using a low temperature MBE-grown InP cap layer

机译:使用低温MBE生长的InP盖层进行量子阱混合的定量组成分析

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摘要

Quantitative compositional evolution is determined for quantum well intermixing (QWI) between In-GaAsP quantum wells (QW) confined by InGaAsP quaternary barriers driven by a low temperature (300℃) MBE grown phosphorous-rich InP cap layer (LT-InP). Presence of the LT-InP cap layer results in a significant blue-shift in the QW photoluminescence (PL) peak during post-growth annealing and in reduction of the PL intensity. Cross-sectional transmission electron microscopy (XTEM) analysis reveals deterioration of the whole structure, with the formation of precipitates and broadening of QWs in the capped structures, whereas relatively small changes take place in the uncapped samples. Energy-dispersive X-ray spectroscopy (EDX) analysis shows that the P concentration in the QW for structures capped with LT-InP is double that of samples without the cap. The EDX data indicates increased P in all layers as the anneal temperature is increased while As precipitates also form.
机译:确定了由InGaAsP四元势垒限制的In-GaAsP量子阱(QW)之间的量子阱混合(QWI)的定量组成演变,该量子阱受低温(300℃)MBE生长的富含磷的InP盖层(LT-InP)驱动。 LT-InP盖层的存在会导致生长后退火期间QW光致发光(PL)峰出现明显的蓝移,并导致PL强度降低。截面透射电子显微镜(XTEM)分析揭示了整个结构的恶化,在封盖的结构中形成了沉淀并形成了QW,而在未封盖的样品中变化相对较小。能量色散X射线光谱(EDX)分析表明,用LT-InP封盖的结构在QW中的P浓度是不使用封盖的样品的P浓度的两倍。 EDX数据表明,随着退火温度的升高,所有层中的P均增加,同时也形成了As析出物。

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