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MBE growth of cubic Al_xIn_(1-x)N and Al_xGa_yIn_(1-x-y)N lattice matched to GaN

机译:立方Al_xIn_(1-x)N和Al_xGa_yIn_(1-x-y)N晶格与GaN匹配的MBE生长

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摘要

Ternary and quaternary cubic c-Al_xIn_(1-x)N/GaN and c-Al_xGa_yIn_(1-x-y)N/GaN heterostructures lattice-matched to c-GaN on freestanding 3C-SiC substrates were grown by plasma-assisted molecular beam epitaxy. The c-Al_xGa_yIn_(1-x-y)N alloy permits the independent control of band gap and lattice parameter. The ternary and quaternary films were grown at 620℃. Different alloy compositions were obtained by varying the Al and Ga fluxes. The alloy composition was measured by Energy Dispersive X-ray Spectroscopy (EDX) and Rutherford Backscattering Spectrometry (RBS). X-ray reciprocal space map of asymmetric (-1-13) reflex were used to measure the lattice parameters and to verify the lattice match between the alloy and the c-GaN buffer.
机译:通过等离子体辅助分子束外延生长在独立式3C-SiC衬底上与c-GaN晶格匹配的三元和四元立方c-Al_xIn_(1-x)N / GaN和c-Al_xGa_yIn_(1-xy)N / GaN异质结构。 c-Al_xGa_yIn_(1-x-y)N合金可独立控制带隙和晶格参数。三元和四元膜在620℃下生长。通过改变Al和Ga通量获得不同的合金成分。通过能量色散X射线光谱法(EDX)和卢瑟福背散射光谱法(RBS)测量合金成分。使用不对称(-1-13)反射的X射线互易空间图来测量晶格参数,并验证合金与c-GaN缓冲液之间的晶格匹配。

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