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首页> 外文期刊>Photonics Journal, IEEE >Effects of Thermal Annealing on the Dynamic Characteristics of InAs/GaAs Quantum Dot Lasers
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Effects of Thermal Annealing on the Dynamic Characteristics of InAs/GaAs Quantum Dot Lasers

机译:热退火对InAs / GaAs量子点激光器动态特性的影响

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We investigated the effects of rapid thermal annealing (RTA) on the dynamic characteristics of the InAs/GaAs ten-layer quantum dot (QD) laser. Improvements in the temperature stability of bandwidth have been demonstrated upon annealing. We attribute the improvements to the following factors: 1) increase in internal quantum efficiency and 2) reduction in temperature dependency of differential gain. The increase in bandwidth at high temperature from the annealed QDs could be due to a reduction in the relaxation time on the order of 0.1 ps. More importantly, the RTA process resulted in better temperature stability in the differential gain and gain compression. This is beneficial for the development of uncooled high-speed QD lasers.
机译:我们研究了快速热退火(RTA)对InAs / GaAs十层量子点(QD)激光器动态特性的影响。退火后已证明带宽的温度稳定性得到改善。我们将这些改进归因于以下因素:1)内部量子效率的提高,以及2)差分增益对温度的依赖性降低。退火QD在高温下带宽的增加可能是由于弛豫时间减少了0.1 ps左右。更重要的是,RTA工艺在差分增益和增益压缩中产生了更好的温度稳定性。这对于开发非冷却高速QD激光器是有益的。

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