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首页> 外文期刊>Photonics Journal, IEEE >Tailoring of Energy Band in Electron-Blocking Structure Enhancing the Efficiency of AlGaN-Based Deep Ultraviolet Light-Emitting Diodes
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Tailoring of Energy Band in Electron-Blocking Structure Enhancing the Efficiency of AlGaN-Based Deep Ultraviolet Light-Emitting Diodes

机译:电子阻挡结构中的能带定制,提高了基于AlGaN的深紫外发光二极管的效率

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摘要

Electron-leakage is a deep-rooted problem for nitride-based light-emitting diodes (LEDs), particularly for AlGaN-based deep-ultraviolet (DUV) LEDs. In this paper, a specific design for the electron-blocking structure in AlGaN DUV LEDs, increasing the Al composition of the last quantum barrier to the same value as that of the electron-blocking layer accompanied with composition-graded p-AlGaN layer, is proposed to reduce electron leakage. Simulation results demonstrate that this design can effectively reduce electron leakage and hence increase internal quantum efficiency. Furthermore, fabricated devices with at an emitting wavelength of 292 nm verify remarkably enhanced light-output power. At 20-mA injection current, the proposed structure achieved a light-output increment as high as 98%, compared with the conventional structure.
机译:对于基于氮化物的发光二极管(LED),特别是对于基于AlGaN的深紫外线(DUV)LED,电子泄漏是一个根深蒂固的问题。本文针对AlGaN DUV LED中的电子阻挡结构的特定设计是,将最后一个量子势垒的Al成分增加到与伴随组分渐变的p-AlGaN层的电子阻挡层相同的值建议减少电子泄漏。仿真结果表明,该设计可以有效减少电子泄漏,从而提高内部量子效率。此外,发射波长为292 nm的装配好的器件可显着提高光输出功率。与传统结构相比,在20 mA的注入电流下,所提出的结构实现了高达98%的光输出增量。

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  • 来源
    《Photonics Journal, IEEE》 |2016年第3期|1-7|共7页
  • 作者单位

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    Engineering Research Center for Semiconductor Integrated Technologies, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

    State Key Laboratory of Solid-State Lighting, Beijing Engineering Research Center for the Third Generation Semiconductor Materials and Application, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    Light emitting diodes; Aluminum gallium nitride; Wide band gap semiconductors; Electric potential; Optical losses; Charge carrier processes; Quantum well devices;

    机译:发光二极管;氮化铝镓;宽带隙半导体;电势;光损耗;电荷载流子工艺;量子阱器件;

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