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Self-assembled Monolayers Mediated Charge Injection For High Performance Bottom-contact Pory(3,3''-didodecylquaterthiophene) Thin-film Transistors

机译:自组装单分子膜介电的高性能底部接触Pory(3,3“'-didodecylquaterthiophene)薄膜晶体管的电荷注入

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摘要

Device performance of bottom-contact poly(3,3"'-didodecylquaterthiophene) (PQT-12) thin-film transistors (TFTs) was significantly improved via surface-modification of Au source-drain (S-D) electrodes with 1-decanethiol and 1H,1H,2H,2H-perfluorodecanethiol self-assembled monolayers (SAMs). By improving the PQT-12 morphology and modulating the Schottky barrier at electrode/PQT-12 contacts, the thiol SAMs chemisorbed onto Au surfaces can improve the charge carrier injection at electrode/PQT-12 contacts and result in dramatic enhancements in device mobilities. Device mobilities up to 0.09 and 0.19 cm~2 V~(-1) s~(-1) were obtained in high performance bottom-contact PQT-12 TFTs with 1-decanethiol and 1H,1H,2H,2H-perfluorodecanethiol SAMs surface-modified Au S-D electrodes, compared with 0.015 cm~2 V~(-1) s~(-1) in PQT-12 TFTs with bare Au electrodes. This work may provide a simple path to the fabrication of high performance, low-cost, and solu-tion-processable bottom-contact OTFTs using fine lithography technology.
机译:通过使用1-癸硫醇和1H对Au源-漏(SD)电极进行表面改性,显着改善了底接触型聚(3,3“'-十二烷基四噻吩(PQT-12)薄膜晶体管(TFT)的器件性能,1H,2H,2H-全氟癸硫醇自组装单分子膜(SAMs)。通过改善PQT-12形态并调节电极/ PQT-12接触处的肖特基势垒,化学吸附到Au表面上的硫醇SAM可以改善电荷载流子注入电极/ PQT-12接触并大大提高了器件的迁移率,在具有以下功能的高性能底部接触式PQT-12 TFT中,器件的迁移率高达0.09和0.19 cm〜2 V〜(-1)s〜(-1)。 1-癸烷硫醇和1H,1H,2H,2H-全氟癸烷硫醇SAMs表面修饰的Au SD电极,而在带有裸露Au电极的PQT-12 TFT中,其为0.015 cm〜2 V〜(-1)s〜(-1)。这项工作可以为使用高性能制造高性能,低成本和可溶液加工的底部接触OTFT提供一条简单的途径。光刻技术。

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