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首页> 外文期刊>Organic Electronics >P-type doping of organic wide band gap materials by transition metal oxides: A case-study on Molybdenum trioxide
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P-type doping of organic wide band gap materials by transition metal oxides: A case-study on Molybdenum trioxide

机译:过渡金属氧化物对有机宽带隙材料的P型掺杂:以三氧化钼为例

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摘要

A study on p-doping of organic wide band gap materials with Molybdenum trioxide using current transport measurements, ultraviolet photoelectron spectroscopy and inverse pho-toelectron spectroscopy is presented. When MoO_3 is co-evaporated with 4,4'-Bis(N-carbaz-olyl)-1,1'-biphenyl (CBP), a significant increase in conductivity is observed, compared to intrinsic CBP thin films. This increase in conductivity is due to electron transfer from the highest occupied molecular orbital of the host molecules to very low lying unfilled states of embedded MO3O9 clusters. The energy levels of these clusters are estimated by the energy levels of a neat MoO_3 thin film with a work function of 6.86 eV, an electron affinity of 6.7 eV and an ionization energy of 9.68 eV. The Fermi level of MoO_3-doped CBP and N,N'-bis(1-naphtyI)-N,N'-diphenyl-l,l'-biphenyl-4,4'-diamine (α-NPD) thin films rapidly shifts with increasing doping concentration towards the occupied states. Pinning of the Fermi level several 100 meV above the HOMO edge is observed for doping concentrations higher than 2 mol% and is explained in terms of a Gaussian density of HOMO states. We determine a relatively low dopant activation of ~0.5%, which is due to Coulomb-trapping of hole carriers at the ionized dopant sites.
机译:提出了利用电流传输测量,紫外光电子能谱和逆光电子能谱对三氧化钼对有机宽带隙材料进行p掺杂的研究。当MoO_3与4,4'-双(N-咔唑-羟基)-1,1'-联苯(CBP)共蒸发时,与本征CBP薄膜相比,电导率显着增加。电导率的这种提高是由于电子从主体分子的最高占据分子轨道转移到嵌入式MO3O9团簇的非常低的未填充状态。这些簇的能级是通过功函数为6.86 eV,电子亲和力为6.7 eV,电离能为9.68 eV的纯MoO_3薄膜的能级估算的。掺杂MoO_3的CBP和N,N'-双(1-萘I)-N,N'-二苯基-1,1'-联苯-4,4'-二胺(α-NPD)薄膜的费米能级快速变化随着对被占州的掺杂浓度增加。对于高于2mol%的掺杂浓度,观察到费米能级的钉扎高于HOMO边缘几百meV,并且用HOMO态的高斯密度来解释。我们确定相对较低的〜0.5%的掺杂活化,这是由于电离的掺杂位点处空穴载流子的库仑捕获。

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