首页> 外文期刊>Optical Materials >Influence of annealing temperature on the electron-lattice coupling strength in terbium doped yttrium alumina perovskite xerogels embedded in nano-porous anodic alumina
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Influence of annealing temperature on the electron-lattice coupling strength in terbium doped yttrium alumina perovskite xerogels embedded in nano-porous anodic alumina

机译:退火温度对掺入纳米多孔阳极氧化铝中掺do钇铝氧钙钛矿干凝胶中电子-晶格耦合强度的影响

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摘要

Terbium doped YA1O_3 xerogels were synthesized and spin-coated onto porous anodic alumina substrates. After deposition the films were annealed at temperatures between 400 and 1000℃. The influence of the annealing temperature on terbium emission and the terbium excitation mechanism were investigated by means of photoluminescence, photoluminescence decay and photoluminescence excitation spectroscopy. It was found that both photoluminescence lifetime and the energy difference between spin-forbidden and spin-allowed 4f-5d transitions decreases with the annealing temperature drop. This dependence was correlated to the electron-lattice coupling strength calculated as a function of annealing temperature.
机译:合成了掺do的YA1O_3干凝胶,并将其旋涂到多孔阳极氧化铝基底上。沉积后,将薄膜在400至1000℃之间的温度下退火。通过光致发光,光致发光衰减和光致发光激发光谱研究了退火温度对ter发射和and激发机理的影响。发现随着退火温度的下降,光致发光寿命以及自旋禁能和自旋允许的4f-5d跃迁之间的能量差均减小。这种依赖性与计算为退火温度的函数的电子-晶格耦合强度相关。

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