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Characterisation of phase-shifts in gratings fabricated by over-dithering and simple displacement

机译:通过过度抖动和简单位移制造的光栅中的相移特性

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摘要

Several different gratings utilizing phase-shifts in their designs are fabricated and characterised: a uniform grating with a single phase shift in the centre, a sine-profile grating (with intrinsic phase shifts at the zeros), and a stretched cosine apodised grating with multiple and arbitrary phase shifts. The gratings are fabricated by either over-dithering the phase mask or a simple displacement of the phase-mask. The gratings are then characterised by measuring their spectral and group delay characteristics and using a grating reconstruction algorithm to determine the apodisation and phase profiles of the grating. The relative susceptibility of the different fabrication methods to errors is discussed along with the role of grating reconstruction in characterisation of gratings.
机译:制作并表征了几种不同的在其设计中利用相移的光栅:一个在中心具有单个相移的均匀光栅,一个正弦轮廓光栅(在零点处具有固有相移)和一个具有多个倍数的拉伸余弦切变光栅和任意相移光栅是通过对相位掩模进行过度抖动或简单地移动相位掩模来制造的。然后通过测量光栅的频谱和群延迟特性并使用光栅重建算法来确定光栅的变迹和相位轮廓,从而表征光栅。讨论了不同制造方法对误差的敏感性,以及光栅重建在光栅表征中的作用。

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