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Analysis of simulation of multiterminal electro-optic modulator based on p-n junction in reverse bias

机译:基于反向偏置的p-n结的多端电光调制器的仿真分析

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摘要

A study of a silicon metal oxide semiconductor (MOS)-type light-emitting device (LED) in which the p-n junction works under a reverse bias and the gate voltage is applied to modulate the electric field distribution from the p~+ region through the n region. The use of gate voltage could result in the generation of a field-induced junction which leads to a decrease of the operating voltage of the LED compared to the two terminal p-n junction LED. The dynamics of the photonic emission in the structure and its related response time, and then a more detailed theoretical and simulation understanding of the photonic emission is achieved, which definitively demonstrates the capability of the device in which a reverse-bias region showing light modulation with multi-GHz bandwidth and gigabit-per-second data rate at near-infrared wavelength. Although the emitted optical power is weak, it is advantageous to utilize the device in all-silicon optoelectronic integrated circuits, especially for short-distance on-chip optical interconnects achieved by standard complementary MOS technology.
机译:硅金属氧化物半导体(MOS)型发光器件(LED)的研究,其中pn结在反向偏置下工作,并施加栅极电压以调制从p〜+区域到整个P〜+区域的电场分布n个区域。栅极电压的使用可能导致产生场感应结,与两端p-n结LED相比,LED的工作电压降低。结构中光子发射的动力学及其相关的响应时间,进而获得了对光子发射的更详细的理论和仿真理解,从而明确证明了器件的功能,其中反向偏光区域显示出光调制在近红外波长下具有数GHz的带宽和每秒千兆比特的数据速率。尽管发出的光功率很弱,但在全硅光电集成电路中使用该器件是有利的,特别是对于通过标准互补MOS技术实现的短距离片上光学互连。

著录项

  • 来源
    《Optical engineering》 |2015年第5期|057104.1-057104.8|共8页
  • 作者单位

    University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, No. 4, Section 2, North Jianshe Road, Chengdu 610054, China;

    Southeast University, National ASIC System Engineering Research Center, Nanjing 210096, China;

    University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, No. 4, Section 2, North Jianshe Road, Chengdu 610054, China;

    Southeast University, National ASIC System Engineering Research Center, Nanjing 210096, China;

    California Institute for Telecommunications and Information Technology, Irvine, California 92697, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    micro-optical devices; optoelectronics; silicon; p-n junction;

    机译:微型光学器件;光电子学硅;p-n结;

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