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Methodology for microscale deformation measurement of free-standing thin films

机译:独立薄膜的微观形变测量方法

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摘要

Deformation measurement at macro/microscale can be fulfilled by a variety of methods with the development of experimental measuring techniques. However, the measurement of free-standing thin films is still difficult, especially for full-field measurement. The difficulty is the fabrication of the deformation markers (such as gratings or speckles) on the free-standing thin films. A grating fabrication technique based on focused ion beam (FIB) deposition is introduced in our previous works, and the superiority of this technique is minimal damage to the surface of the specimen. We adopted this FIB deposition technique to fabricate a frequency of 2000 line/mm gratings on the free-standing metallic films with a thickness of 2 μm. Notches of 10 μm length and 2 μm width are prepared by the FIB etching at the edge of the films. An in situ tensile test is operated in the scanning electronic microscope system. At the crack initiation stage, the displacement field is measured from the deformation of the gratings. The fracture parameter J integral is characterized for the 2-μm metallic films. The results demonstrate that the full-field measurement of the free-standing thin films at microscale can be realized successfully by this method.
机译:随着实验测量技术的发展,可以通过多种方法来实现宏观/微观尺度的变形测量​​。然而,自支撑薄膜的测量仍然困难,特别是对于全场测量。困难在于在独立的薄膜上制造变形标记(例如光栅或斑点)。在我们以前的工作中介绍了一种基于聚焦离子束(FIB)沉积的光栅制造技术,该技术的优势在于对样品表面的损害最小。我们采用了这种FIB沉积技术,在厚度为2μm的自支撑金属膜上制造了频率为2000行/毫米的光栅。通过FIB蚀刻在膜的边缘处准备10μm长和2μm宽的槽口。在扫描电子显微镜系统中进行原位拉伸测试。在裂纹萌生阶段,根据光栅的变形来测量位移场。对于2-μm金属膜,表征了断裂参数J积分。结果表明,该方法可以成功实现微米级自支撑薄膜的全场测量。

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