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首页> 外文期刊>Optical engineering >Design considerations for λ-3.0- to 3.5-μm-emitting quantum cascade lasers on metamorphic buffer layers
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Design considerations for λ-3.0- to 3.5-μm-emitting quantum cascade lasers on metamorphic buffer layers

机译:变质缓冲层上发射λ-3.0-3.5μm的量子级联激光器的设计注意事项

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摘要

Quantum cascade lasers (QCLs) that employ metamorphic buffer layers as substrates of variable lattice constant have been designed for emission in the 3.0- to 3.5-μm wavelength range. Theoretical analysis of the active-region (AR) energy band structure, while using an 8-band k•p model, reveals that one can achieve both effective carrier-leakage suppression as well as fast carrier extraction in QCL structures of relatively low strain. Significantly lower indium-content quantum wells (QWs) can be employed for the AR compared to QWs employed for conventional short-wavelength QCL structures grown on InP, which, in turn, is expected to eliminate carrier leakage to indirect-gap valleys (X, L). An analysis of thermo-optical characteristics for the complete device design indicates that high-AI-content AllnAs cladding layers are more effective for both optical confinement and thermal dissipation than InGaP cladding layers. An electroluminescence-spectrum full-width half-maximum linewidth of 54.6 meV is estimated from interface roughness scattering and, by considering both inelastic and elastic scattering, the threshold-current density for 3.39-μm-emitting, 3-mm-long back-facet-coated
机译:设计了采用变质缓冲层作为可变晶格常数衬底的量子级联激光器(QCL),可在3.0至3.5μm的波长范围内发射光。对有源区(AR)能带结构的理论分析,虽然使用8波段k•p模型,但揭示了在相对较低应变的QCL结构中,既可以实现有效的载流子泄漏抑制,又可以实现快速的载流子提取。与在InP上生长的常规短波长QCL结构所使用的QW相比,AR可以采用更低的铟含量量子阱(QW),从而有望消除载流子泄漏到间接间隙谷(X, L)。完整器件设计的热光特性分析表明,高AI含量的AllnAs包层比InGaP包层在光学限制和散热方面更有效。根据界面粗糙度散射,并通过考虑非弹性散射和弹性散射,可估计出3.39μm发射,3 mm长的背面的阈值电流密度,得出电致发光光谱的全宽度半最大线宽为54.6 meV。涂层

著录项

  • 来源
    《Optical engineering》 |2018年第1期|011017.1-011017.10|共10页
  • 作者单位

    University of Wisconsin-Madison, Department of Electrical and Computer Engineering, Madison, Wisconsin, United States;

    University of Wisconsin-Madison, Department of Electrical and Computer Engineering, Madison, Wisconsin, United States;

    lntraband LLC, Madison, Wisconsin, United States;

    Massachusetts Institute of Technology, Research Laboratory of Electronics, Cambridge, Massachusetts, United States;

    University of Wisconsin-Madison, Department of Electrical and Computer Engineering, Madison, Wisconsin, United States;

    University of Wisconsin-Madison, Department of Electrical and Computer Engineering, Madison, Wisconsin, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    quantum cascade laser; metamorphic buffer layer; semiconductor laser; metalorganic chemical vapor deposition;

    机译:量子级联激光器变质缓冲层半导体激光器金属有机化学气相沉积;

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