首页> 外文期刊>Optical and quantum electronics >Effect of molar concentration of CuCl_2 on the characteristics of Cu_2S film
【24h】

Effect of molar concentration of CuCl_2 on the characteristics of Cu_2S film

机译:CuCl_2摩尔浓度对Cu_2S膜特性的影响

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

In this work, the influence of molar concentration of CuCl_2 on copper sulfide Cu_2S film synthesized by chemical bath deposition and on the performance of p-Cu_2S/p-Si hetero-junction photodetector was studied. The effect of copper chloride concentration on the structural, optical properties and electrical properties of Cu_2S film was investigated. The optical studies show that the optical energy gap varied from 2.68 to 2.8 eV as the concentration varied from 0.06 to 0.15 M. X-ray diffraction XRD results confirm that the deposition films having of monoclinic chalcocite phase. Scanning electron microscope SEM investigation illustrate the formation of nanostructured Cu_2S film with particle size ranged from 50 to80 nm depending on the copper chloride concentration. Two Raman peaks were observed located at 265 and 470 cm"1 assigned to the Cu-S bond vibration and vibrational stretching mode, respectively. The mobility of charge carriers in the film and the electrical conductivity of the film were investigated as a function of copper chloride concentration. Dark and illuminated Ⅰ-Ⅴ characteristics of p-Cu_2S/p-Si heterojunction HJ photodetectors were measured at room temperature. The best rectification was for heterojunction prepared at 0.13 M CuCl_2. The maximum responsivity of the photodetector was about 0.67AAV at 450 nm for photodetector prepared at 0.13 M.
机译:在这项工作中,研究了CuCl_2对通过化学浴沉积合成的硫化铜Cu_2S膜的CuCl_2对P-Cu_2S / P-Si杂结光电探测器的影响。研究了氯化铜浓度对Cu_2S膜的结构,光学性质和电学性质的影响。光学研究表明,由于浓度从0.06至0.15M变化,光学能隙在2.68至2.8eV中变化。X射线衍射XRD结果的浓度变化确认沉积膜具有单斜氯钴晶岩相的沉积膜。扫描电子显微镜SEM调查说明了颗粒尺寸的纳米结构Cu_2S膜的形成,其根据氯化铜浓度为50至80nm。观察到位于分配给Cu-S键振动和振动拉伸模式的265和470cm“1的两个拉曼峰值。作为铜的函数,研究了膜中的电荷载体和电导率的电导率氯化物浓度。在室温下测量暗和照明的P-CU_2S / P-Si异质结Hj光电探测器的特性。最佳整流是在0.13 m Cucl_2时制备的异质结。光电探测器的最大响应率为约0.67AAV用于光电探测器的450nm,在0.13米下制备。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号