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机译:平均功率谱密度,Au纳米颗粒的分形和多术光谱沉积在退火上的TiO_2薄膜上
Department of Physics Kermanshah Branch Islamic Azad University Kermanshah Iran;
Physics Department Deen Dayal Upadhyay Govt. P.G. College Saidabad Allahabad 221508 India;
The Directorate of Research Development and Innovation Management (DMCDI) Technical University of Cluj-Napoca Constantin Daicoviciu St. No. 15 400020 Cluj-Napoca Cluj County Romania;
Research Centre in Physics of Matter and Radiation (PMR) LISE Laboratory University of Namur 5000 Namur Belgium;
Department of Physics Kermanshah Branch Islamic Azad University Kermanshah Iran;
School of Physics Institute for Research in Fundamental Sciences (IPM) P.O. Box 19395-5531 Tehran Iran;
Gold nano particles; TiO_2 thin films; Multifractal analysis; Stereometric analysis; Atomic force microscopy;
机译:基于功率的基于电力密度的低成本溶液加工Al掺杂ZnO薄膜的退火效应分形分分
机译:电子束蒸发沉积氧化镧薄膜的原子力显微镜图像的多重分形光谱
机译:二维多重分形趋势波动分析与二维多重分形趋势移动平均算法估计多重分形谱的比较研究
机译:退火温度对溶胶 - 凝胶沉积Nb掺杂TiO_2薄膜性能的影响
机译:氢在PECVD沉积的氮化硅薄膜中的重新分布。
机译:退火温度对化学浴镀(CBD)技术在低溶液浓度下沉积的CdS薄膜光学光谱的影响
机译:功率谱密度和分形几何Cu / Ni纳米复合薄膜的表面微观分析