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Design and fabrication of GaInAsP/InP VCSEL with two a-Si/a-SiNx bragg reflectors

机译:具有两个a-Si / a-SiNx布拉格反射器的GaInAsP / InP VCSEL的设计和制造

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摘要

We report on the design and fabrication of a 1.55 mu m wavelength Vertical Cavity Surface Emitting Lasers (VCSELs) which consists of two dielectric Bragg mirrors and a InGaAsP-based active region. The dielectric materials are amorphous silicon and amorphous silicon nitride. Layers of such materials have been deposited by magnetron sputtering and analyzed in order to determine their optical properties. A large refractive index difference of 1.9 is found between these materials. Distributed Bragg Reflectors (DBRs) based on these dielectric materials quarter wave layers have been studied by optical measurements and confronted to theoretical calculations based on the transfer matrix method. A maximum reflectivity of 99.5% at 1.55 mu m and a large spectral bandwidth of 800 nm are reached with only four and a half periods of a-Si/a-SiNx. The VCSEL was fabricated by metallic bonding process. This method allows to bond an InP-based active region as the gain medium on a Si substrate thanks to the formation of a Au-In alloy. This process is performed at a low temperature of 240 degrees C without damaging the optical properties of the microcavity. This VCSEL has been characterized by an optical pumping experiment with a low and a high-density optical power and a laser emission has been obtained at room-temperature.
机译:我们报告了设计和制造的1.55微米波长垂直腔表面发射激光器(VCSEL),该激光器由两个介电布拉格反射镜和一个基于InGaAsP的有源区组成。介电材料是非晶硅和非晶氮化硅。这种材料的层已经通过磁控溅射沉积并且被分析以确定其光学性质。在这些材料之间发现折射率差异较大,为1.9。已经通过光学测量研究了基于这些介电材料四分之一波层的分布式布拉格反射器(DBR),并面对了基于传递矩阵法的理论计算。仅用a-Si / a-SiNxx的四个半周期就可以在1.55μm处实现99.5%的最大反射率和800 nm的大光谱带宽。 VCSEL是通过金属键合工艺制造的。由于形成了Au-In合金,该方法允许将基于InP的有源区作为增益介质键合在Si衬底上。该过程在240℃的低温下进行而不会损害微腔的光学特性。该VCSEL的特征在于具有低和高密度光功率的光泵浦实验,并且在室温下获得了激光发射。

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