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Design and fabrication of highly efficient electrooptic modulators using Bragg grating reflectors.

机译:使用布拉格光栅反射器的高效电光调制器的设计和制造。

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摘要

Bragg grating reflectors etched in amorphous silicon overlay films have been integrated with Ti:LiNbO3 optical waveguides. With a 12.5 mm long grating segment and an etch depth of ∼93 nm in a 105 nm-thick silicon film, a narrow (0.05 nm) spectral bandwidth with a record high transmission dip (> 20 dB) was achieved at a wavelength of ∼1542 nm for TE polarization on an x-cut, y-propagating substrate. The reflectance in the channel waveguides is found to be strongly dependent on the depth of the etched grating. The 3-dB bandwidth of 0.05 nm obtained for all tested samples is the smallest reported for waveguides in LiNbO3 . The effect of the Bragg waveguide loss factor on the transmittance and reflectance spectra is investigated using a model for contra-directional coupling that includes an attenuation coefficient.;The Bragg grating spectral characteristics are exploited to fabricate distributed Bragg feedback modulators (DBFM) and Bragg reflector Fabry-Perot modulators (BFPM). The sharp cut-off in transmission and reflection spectra, which is an inherent characteristic of Bragg grating, was tuned by applying voltage via the linear electrooptic effect, to produce intensity modulation.;The Bragg grating based modulators consume less electric power compared to polarization intensity modulators (PIMs). The DBFM demonstrates 1/1.6 times the modulating voltage of a PIM with identical waveguide and electrode structure. The BFPM shows 1/3.3 times the modulating voltage of the PIM. No difference in the frequency response is observed among the three modulators. Comparison of the modulation sensitivity in the linear region indicates that the Bragg grating based modulators provide better sensitivity than that of the PIM with identical waveguide and electrode structure.;These results indicate the potential advantage of the Bragg grating based modulators for enhanced modulation efficiency over conventional modulators. Further improvements can be expected from the optimization of the electrode design.
机译:在非晶硅覆盖膜中蚀刻的布拉格光栅反射器已与Ti:LiNbO3光波导集成在一起。在105 mm厚的硅膜中,光栅段长为12.5 mm,蚀刻深度为〜93 nm,在〜的波长下获得了创纪录的高透射率(> 20 dB)的窄(0.05 nm)光谱带宽。在x切割,y传播的基板上,TE偏振为1542 nm。发现通道波导中的反射率很大程度上取决于蚀刻光栅的深度。对于所有测试样品,获得的0.05 dB的3 dB带宽是LiNbO3中波导的最小报告值。使用包含衰减系数的双向耦合模型研究了布拉格波导损耗因子对透射率和反射率谱的影响。利用布拉格光栅的光谱特性来制造分布式布拉格反馈调制器(DBFM)和布拉格反射器法布里-珀罗调制器(BFPM)。通过线性电光效应施加电压来调谐透射和反射光谱的急剧截止,这是布拉格光栅的固有特性,从而产生强度调制;与偏振强度相比,基于布拉格光栅的调制器消耗的电能更少调制器(PIM)。 DBFM演示了具有相同波导和电极结构的PIM的调制电压的1 / 1.6倍。 BFPM表示PIM调制电压的1 / 3.3倍。在三个调制器之间没有观察到频率响应的差异。线性区域中调制灵敏度的比较表明,基于布拉格光栅的调制器比具有相同波导和电极结构的PIM具有更好的灵敏度;这些结果表明,基于布拉格光栅的调制器与传统方法相比具有潜在的优势,可以提高调制效率调制器。从电极设计的优化中可以期待进一步的改进。

著录项

  • 作者

    Kim, Ryoung-han.;

  • 作者单位

    Texas A&M University.;

  • 授予单位 Texas A&M University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 140 p.
  • 总页数 140
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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