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Calculation and verification of thermal stress in InSb focal plane arrays detector

机译:InSb焦平面阵列探测器中热应力的计算和验证

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摘要

Both the InSb chip fracture and the local delamination appearing in the negative electrode region of InSb infrared focal plane arrays (IRFPAs) detectors in liquid nitrogen shock tests are the major failure patterns of the InSb IRFPAs. To analyze the inducements to these typical failure patterns, it is imperative to obtain both the thermal mismatch stresses values and their distributions in the InSb IRFPAs. In this paper, the analytical model developed by C. H. Hsueh is firstly employed to calculate the in-plane normal stresses in the center region of the InSb IRFPAs, the in-plane shear forces per unit width outside the center region of the InSb IRFPA, and the peeling moments per unit width outside the center region of the InSb IRFPA. Secondly, the structural model of the InSb IRFPAs created by us with ANSYS software is also employed to extract the distributions of the in-plane normal stresses, the distributions of the interfacial shear stresses, and the distributions of the out-of-plane normal stresses. After that comparing both the calculated in-plane normal stresses and the interfacial shear forces with the corresponding simulated results, we think that the calculating accuracy of the analytical model is comparable to the simulating accuracy of the ANSYS model of the InSb IRFPAs, and the relative errors are smaller than 10%. All these findings provide the technical means in guiding both the structural design and the structural optimization of the InSb IRFPAs assembly in the future.
机译:InSb红外焦平面阵列(IRFPA)检测器的负电极区域中出现的InSb芯片断裂和局部分层都是液氮冲击测试中的主要失效模式。为了分析这些典型失效模式的诱因,必须同时获得InSb IRFPA中的热失配应力值及其分布。在本文中,CH Hsueh开发的分析模型首先用于计算InSb IRFPA中心区域的平面内法向应力,InSb IRFPA中心区域以外的单位宽度的平面内剪力,以及InSb IRFPA中心区域外部每单位宽度的剥离力矩。其次,我们还利用ANSYS软件创建的InSb IRFPA的结构模型来提取平面内法向应力的分布,界面剪切应力的分布以及平面外法向应力的分布。 。在将计算出的面内法向应力和界面剪切力与相应的模拟结果进行比较之后,我们认为分析模型的计算精度与InSb IRFPA的ANSYS模型的仿真精度相当,相对误差小于10%。所有这些发现为将来指导InSb IRFPAs组件的结构设计和结构优化提供了技术手段。

著录项

  • 来源
    《Optical and quantum electronics》 |2017年第12期|402.1-402.11|共11页
  • 作者单位

    Academy Key Laboratory of Science and Technology on Infrared Detector, China Airborne Missile Academy, Luoyang 471009, China,School of Electrical Engineering, Henan University of Science and Technology, Luoyang 471023, China;

    School of Electrical Engineering, Henan University of Science and Technology, Luoyang 471023, China;

    Academy Key Laboratory of Science and Technology on Infrared Detector, China Airborne Missile Academy, Luoyang 471009, China;

    Academy Key Laboratory of Science and Technology on Infrared Detector, China Airborne Missile Academy, Luoyang 471009, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Infrared focal plane arrays; Thermal mismatch stress; Interfacial stress distribution;

    机译:红外焦平面阵列;热失配应力;界面应力分布;

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