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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Molecular dynamics simulation of defect production in collision cascades in zircon
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Molecular dynamics simulation of defect production in collision cascades in zircon

机译:锆石碰撞级联中缺陷产生的分子动力学模拟

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摘要

Defect production in collision cascades in zircon has been examined by molecular dynamics simulations using a partial charge model combined with the Ziegler-Biersack-Littmark potential. U, Zr, Si and O recoils with energies ranging from 250eV to 5 keV were simulated in the NVE ensemble. To obtain good statistics, 5-10 cascades in randomly chosen directions were simulated for each ion and energy. The damage consists of mainly Si and O Frenkel pairs, a smaller number of Zr Frenkel pairs, and Zr on Si antisite defects. Defect production, interstitial clustering, ion beam mixing and Si-O-Si polymerization increase with PKA mass and energy.
机译:通过分子动力学模拟,使用结合了Ziegler-Biersack-Littmark势能的部分电荷模型,对锆石碰撞级联中的缺陷产生进行了检查。在NVE合奏中模拟了能量范围为250eV至5 keV的U,Zr,Si和O反冲。为了获得良好的统计数据,对每种离子和能量在随机选择的方向上模拟了5-10个级联。损伤主要由Si和O Frenkel对,少量Zr Frenkel对以及Zr反Si缺陷组成。缺陷产生,间隙聚集,离子束混合和Si-O-Si聚合随着PKA质量和能量的增加而增加。

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