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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >e-Induced secondary electron emission yield of insulators and charging effects
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e-Induced secondary electron emission yield of insulators and charging effects

机译:电子诱导绝缘子的二次电子发射率和充电效应

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Based on a more realistic description of the in-depth secondary electron generation than that of standard (constant loss) model, a new model for the e-induced secondary electron emission yield, delta = f(E-0), is applied to account for the observed mean atomic number dependence of the reduced yield curves (RYC), delta/delta(max) = f(E-0/E-max(0)) of a wide variety of inorganic insulators. It is next used to extract and to discuss physical information on secondary electron escape probability and attenuation length of a number of oxides and alkali halides and to deduce their X-ray-induced secondary electron emission yield, delta(x) = f(hv). Extrapolation of experimental data above the few keV energy range including the estimate of the nominal critical energy E is also illustrated. Correlation between time dependence of charging and of secondary electron emission is next analyzed and various charging effects such as the observed negative charging when a positive charging was expected or the possible change of sign of the specimen current, are explained by the difference between E-2(0) and E-2(C) (critical energy obtained under permanent irradiation). Strategies to identify charging effects via their influence on the distortion of the yield curve and to reduce them are finally suggested. (c) 2005 Elsevier B.V. All rights reserved.
机译:基于比标准(恒定损耗)模型更深入的二次电子生成的描述,采用了一种新的电子感应二次电子发射量模型,即delta = f(E-0)。对于降低的屈服曲线(RYC)的观察到的平均原子序数依赖性,多种无机绝缘子的delta / delta(max)= f(E-0 / E-max(0))。接下来将其用于提取和讨论有关许多氧化物和碱金属卤化物的二次电子逸出概率和衰减长度的物理信息,并推论它们在X射线诱导下的二次电子发射产率delta(x)= f(hv) 。还说明了超出几个keV能量范围的实验数据的外推,包括标称临界能量E的估计。接下来分析充电与二次电子发射的时间依赖性之间的相关性,并通过E-2之间的差异来解释各种充电效果,例如预期正充电时观察到的负充电或样品电流的正负号可能变化。 (0)和E-2(C)(在永久照射下获得的临界能量)。最后提出了通过影响充电曲线的失真来识别充电效应并降低其影响的策略。 (c)2005 Elsevier B.V.保留所有权利。

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