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机译:退火对基于等离子体的离子注入Ti6Al4V上氧注入层的结构和硬度的影响
Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China Shanghai Institute of Ceramics Chinese Academy of Sciences, Shanghai 200050, China;
School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China;
School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China;
Shanghai Institute of Ceramics Chinese Academy of Sciences, Shanghai 200050, China;
Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China;
titanium alloy; implantation; annealing; structure; hardness;
机译:退火对基于等离子体的离子注入Ti6Al4V上氧注入层力学行为的影响
机译:通过退火在Ti6Al4V和Ti上的氧注入层的相形成调整
机译:等离子氧离子注入Ti6Al4V合金改性层的结构和摩擦学性能
机译:等离子体离子注入在Ti6A14V基体上氮掺杂介孔TiO2层的结构和可见光催化活性
机译:超薄氧注入绝缘体上硅材料的微观结构和加工条件的相关性。
机译:在不同的注入后退火后p型铝注入的4H-SiC层上的欧姆接触
机译:热脉冲退火前后氧注入(111)硅的结构
机译:热脉冲退火前后氧注入(111)硅的结构