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Technical improvements and performance of the HVE AMS sputter ion source SO-110

机译:HVE AMS溅射离子源SO-110的技术改进和性能

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The cesium sputter ion source model SO-110, with its latest upgrade SO-110C, is designed to fulfill the stringent requirements of AMS. It has a storage capacity of up to 200 samples for unattended operation and accepts solid as well as gaseous CO_2 samples. The samples are stored in a separate vacuum chamber and transported upon use into the hot central part of the ion source, thereby minimizing cross-talk between the samples. The very open construction of the source head optimizes pumping of evaporated sample material, thus minimizing the source memory. Details of the geometry of the interior of the source were shaped to yield a small Cs~+ spot size with virtually no halo, minimizing background for measurement of volatile samples. The latest upgrade of the source to model SO-110C increased the sputter voltage capability to 12 kV. Consequently, the SO-110C produces ~(27)Al~− outputs of up to 2 μA, ~9BeO~− outputs of more than 30 μA and ~(12)C~− beams in excess of 400 μA. The latest upgrade also addresses several servicing issues, including easy replacement of disposable parts as well as ensuring optimal alignment of critical parts.
机译:铯溅射离子源型号SO-110及其最新升级版SO-110C旨在满足AMS的严格要求。它具有多达200个样品的无人值守操作存储能力,可以接受固体和气体CO_2样品。样品被存储在一个单独的真空室中,并在使用时被运输到离子源的热中心部分,从而最大程度地减少了样品之间的串扰。源头的非常开放的结构优化了蒸发样品材料的泵送,从而最小化了源存储器。对源内部几何形状的细节进行整形,以产生小的Cs〜+点尺寸,几乎没有光晕,从而最小化了挥发性样品的测量背景。将电源最新升级为SO-110C型号后,溅射电压能力提高到12kV。因此,SO-110C产生的〜(27)Al〜-输出高达2μA,〜9BeO〜-输出超过30μA,〜(12)C〜-光束超过400μA。最新的升级还解决了几个维修问题,包括易于更换一次性部件以及确保关键部件的最佳对准。

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