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Ionoluminescence and photoluminescence study of annealing and ion irradiation effects on zinc oxide

机译:退火和离子辐照对氧化锌的电致发光和光致发光研究

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摘要

The effects of annealing at 473 K and 800 K and of 2 MeV H~+ irradiation on the behaviour of defects in ZnO crystals were studied via ionoluminescence (IL) and photoluminescence (PL). The PL spectra of samples annealed in vacuum at 473 K and 800 K showed stronger visible emission and weaker UV emission than virgin samples. The stronger visible emission corresponded to an increase in the concentration of point defects in the samples. The PL spectra of the sample annealed in vacuum at 473 K revealed stronger visible emission than that of the sample annealed in vacuum at 800 K; hence, the concentration of point defects in the sample annealed at 473 K was higher. The IL spectrum of ZnO annealed in vacuum at 473 K showed a weaker intensity than the spectrum of the sample annealed at 800 K, which seemed inconsistent with the PL spectra results. This inconsistency was attributed to different mechanism of PL and IL. IL and PL in some way link the ZnO DBE to different point defect related electronic transfer processes. The PL spectra of samples showed that deep band emission (DBE) is a superposition of 2.1 eV band emission and 2.4 eV band emission and that near band emission (NBE) is a superposition of 3.1 eV band emission and 3.3 eV band emission. However, the DBE of IL is a superposition of 1.8 eV band emission and 2.1 eV band emission, and the NBE exhibited overall weak intensity caused by an increase in the number of defects induced during irradiation. Comparing the effects of annealing in an oxygen atmosphere and in vacuum, the enhanced peak area ratio of 2.1 eV band emission to 2.4 eV band emission in the PL spectra and the enhanced peak area ratio of 2.1 eV band emission to 1.8 eV band emission in the IL spectra of the sample annealed in an oxygen atmosphere demonstrate a correspondence between the ~1.8 eV band and Zn interstitials (Zn_i), between the ~2.1 eV band and O interstitials (Oi) and between the ~2.4 eV band and O vacancies (Vo). The increase in the UV emission of the sample annealed in an oxygen atmosphere suggested that the NBE is a superposition of 3.1 eV band emission and 3.3 eV band emission, which are associated with Zn vacancies (V_(Zn)) and self-trapped excitons, respectively.
机译:通过电离发光(IL)和光致发光(PL)研究了在473 K和800 K下退火以及2 MeV H〜+辐照对ZnO晶体缺陷行为的影响。与原始样品相比,在473 K和800 K真空下退火的样品的PL光谱显示出更强的可见光发射和更弱的UV发射。较强的可见光发射对应于样品中点缺陷浓度的增加。与在800 K真空下退火的样品相比,在473 K真空下退火的样品的PL光谱显示出更强的可见光发射。因此,在473 K退火的样品中点缺陷的浓度更高。在473 K下真空退火的ZnO的IL光谱强度比在800 K下退火的样品的光谱弱,这似乎与PL光谱结果不一致。这种不一致归因于PL和IL的不同机制。 IL和PL以某种方式将ZnO DBE链接到与不同点缺陷相关的电子转移过程。样品的PL光谱表明,深波段发射(DBE)是2.1 eV波段发射和2.4 eV波段发射的叠加,而近波段发射(NBE)是3.1 eV波段发射和3.3 eV波段发射的叠加。但是,IL的DBE是1.8 eV带发射和2.1 eV带发射的叠加,并且NBE表现出总体强度弱,这是由于辐照期间引起的缺陷数量增加所致。比较氧气气氛和真空中退火的效果,PL光谱中2.1 eV带发射的峰面积比对2.4 eV带发射的峰面积比增加,以及2.1 eV带发射对1.8 eV谱带发射的峰面积比增加。在氧气气氛中退火的样品的IL光谱显示〜1.8 eV带与Zn间隙(Zn_i)之间,〜2.1 eV带与O间隙(Oi)之间以及〜2.4 eV带与O空位(Vo)之间存在对应关系)。在氧气气氛中退火的样品的UV发射增加表明NBE是3.1 eV带发射和3.3 eV带发射的叠加,这与锌空位(V_(Zn))和自陷激子有关,分别。

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