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Thin films of HfO_2 and ZrO_2 as potential scintillators

机译:HfO_2和ZrO_2薄膜作为潜在的闪烁体

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摘要

Emission, excitation and absorption spectra of HfO_2 and ZrO_2 thin films grown by atomic layer deposition were investigated in the temperature range of 10-300 K. Time-resolved luminescence spectra were excited with a pulsed ArF laser and tuneable synchrotron radiation in UV-VUV. The strong emission with the peak position at 4.2-4.4 eV and with the decay time in μs range was revealed at 10 K in both materials. The emission was ascribed to the radiative decay of self-trapped excitons (STE). the features observed in the absorption and excitation spectra at 5.8 and 5.4 eV were most probably due to the formation of excitons; While the interband transitions started to dominate at 6.15 and 5.85ev in HfO_2 and ZrO_2, respectively.
机译:研究了在10-300 K的温度范围内原子层沉积生长的HfO_2和ZrO_2薄膜的发射,激发和吸收光谱。使用脉冲ArF激光和可调谐同步辐射在UV-VUV中激发了时间分辨的发光光谱。在这两种材料中,在10 K处都显示出峰值位置为4.2-4.4 eV且衰减时间在μs范围内的强发射。发射归因于自陷激子(STE)的辐射衰减。在5.8和5.4 eV的吸收和激发光谱中观察到的特征很可能是由于激子的形成。在HfO_2和ZrO_2中,带间过渡分别在6.15和5.85ev处占主导地位。

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