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Microwave-induced chemical etching (MCE): A fast etching technique for the solid polymeric track detectors (SPTD)

机译:微波诱导化学蚀刻(MCE):一种用于固体聚合物轨迹检测器(SPTD)的快速蚀刻技术

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摘要

The procedure of chemical etching (CE) or electro-chemical etching (ECE) is an inevitable step to reveal the ion-induced latent tracks in solid polymeric track detectors (SPTD). In this work, a microwave-induced chemical etching (MCE) technique is introduced, for the first time, to etch the SPTDs with much less (about on tenth) time as compared to the traditional etching methods (CE and/or ECE). The photomicrographs of the CR-39 s treated with MCE are presented in the paper and are compared with those processed with CE and ECE. The α-tracks started appearing just after 10 min of etching and were fully developed after 25 min, which usually takes several hours by CE and ECE techniques. The tracks were observed to be developed clearly with well-defined, smooth and sharp edges thereby improving the measurements using image analyser. The MCE technique is found to be promising, simple, faster and convenient.
机译:化学刻蚀(CE)或电化学刻蚀(ECE)的过程是揭示固体聚合物轨迹检测器(SPTD)中离子诱导的潜在轨迹的必然步骤。在这项工作中,首次引入了微波诱导化学蚀刻(MCE)技术,与传统蚀刻方法(CE和/或ECE)相比,蚀刻SPTD的时间要少得多(约十分之一)。本文介绍了用MCE处理过的CR-39的显微照片,并将其与用CE和ECE处理过的照片进行了比较。蚀刻10分钟后,α轨迹开始出现,并在25分钟后完全显影,这通常需要通过CE和ECE技术花费几个小时。观察到的轨迹清晰清晰,边缘清晰,平滑且锋利,从而改善了使用图像分析仪的测量效果。发现MCE技术是有前途的,简单的,更快的和方便的。

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