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The ultralight DEPFET pixel detector of the Belle Ⅱ experiment

机译:BelleⅡ实验的超轻DEPFET像素检测器

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摘要

An upgrade of the existing Japanese flavor factory (KEKB in Tsukuba, Japan) is under construction and foreseen for commissioning by the end of 2017. This new e~+e~- machine (SuperKEKB) will deliver an instantaneous luminosity 40 times higher than the luminosity world record set by KEKB. To fully exploit the increased number of events and provide high precision measurements of B-meson decay vertices in such a harsh environment, the Belle detector will be upgraded to Belle Ⅱ, featuring a new silicon vertex detector with two pixel layers close to the interaction point based on the DEPFET (DEpleted P-channel Field Effect Transistor) technology. This technology combines particle detection together with in-pixel amplification by integrating a field effect transistor into a fully depleted silicon bulk. In Belle Ⅱ, DEPFET sensors thinned down to 75 μm with low power consumption and low intrinsic noise will be used. The first large thin multi-chip production modules have been produced and characterization results on both large modules as well as small test systems will be presented in this contribution.
机译:现有的日本风味工厂(日本筑波的KEKB)的升级项目正在建设中,预计将于2017年底投入使用。这台新的e〜+ e〜-机器(SuperKEKB)的瞬时发光度比传统的高出40倍。 KEKB创造的光度世界纪录。为了充分利用不断增加的事件数量并在如此恶劣的环境中提供B介子衰减顶点的高精度测量,Belle检测器将升级为BelleⅡ,其特点是新型的硅顶点检测器具有两个接近相互作用点的像素层基于DEPFET(耗尽型P沟道场效应晶体管)技术。通过将场效应晶体管集成到完全耗尽的硅块中,该技术将粒子检测与像素内放大结合在一起。在BelleⅡ中,将使用低功耗和低固有噪声的薄至75μm的DEPFET传感器。已生产出第一批大型的薄型多芯片生产模块,并将在此功能中介绍大型模块以及小型测试系统的表征结果。

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