机译:通过DIII-D中基于物理模型的q轮廓反馈控制,增强了L模式等离子体放电的重现性
Lehigh University, Bethlehem, PA, United States;
Lehigh University, Bethlehem, PA, United States;
Lehigh University, Bethlehem, PA, United States;
Lehigh University, Bethlehem, PA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
General Atomics, San Diego, CA, United States;
current profile control; enhanced discharge reproducibility; model-based optimization; plasma control;
机译:最佳电流曲线控制,可增强DIII-D中L模式和H模式放电的可重复性
机译:DIII-D放电中增强分流器和边缘辐射的杂质反馈控制
机译:DIII-D,ASDEX-Upgrade和JET L-mode等离子体中循环源和核心等离子体燃料的极化分布
机译:基于物理模型的安全系数和内部能量反馈控制器在DIII-D高级托卡马克场景中的实验和仿真测试
机译:反馈控制的整合和运行控制对氧化铪薄膜的等离子体增强的原子层沉积
机译:超极化后内源性腺苷增强介质对动作电位放电的反馈抑制
机译:用于Diii-D放电的增强分流器和边缘辐射的杂质反馈控制
机译:在DIII-D放电中增强偏滤器和边缘辐射的杂质反馈控制