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Remote modulation doping in van der Waals heterostructure transistors

机译:范德瓦尔斯异质结构晶体管中的远程调制掺杂

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摘要

Carriers in a molybdenum disulfide transistor can be modulated without decreasing mobility by remote doping and charge transfer through a van der Waals heterostructure, which avoids dopant-induced impurity scattering in the channel.Doping is required to modulate the electrical properties of semiconductors but introduces impurities that lead to Coulomb scattering, which hampers charge transport. Such scattering is a particular issue in two-dimensional semiconductors because charged impurities are in close proximity to the atomically thin channel. Here we report the remote modulation doping of a two-dimensional transistor that consists of a band-modulated tungsten diselenide/hexagonal boron nitride/molybdenum disulfide heterostructure. The underlying molybdenum disulfide channel is remotely doped via controlled charge transfer from dopants on the tungsten diselenide surface. The modulation-doped device exhibits two-dimensional-confined charge transport and the suppression of impurity scattering, shown by increasing mobility with decreasing temperature. Our molybdenum disulfide modulation-doped field-effect transistors exhibit a room-temperature mobility of 60 cm(2) V-1 s(-)(1); in comparison, transistors that have been directly doped exhibit a mobility of 35 cm(2) V-1 s(-)(1).
机译:可以调节钼二硫化钼晶体管中的载流子,而不通过远程掺杂和通过van der WaaS异质结构来降低迁移率,这避免了通道中的掺杂剂诱导的杂质散射。需要调节半导体的电性能,但引入杂质导致库仑散射,妨碍了电荷运输。这种散射是二维半导体中的特定问题,因为带电杂质靠近原子薄通道。在这里,我们报告了由带调制钨烯烯烃/六边形氮化硼/六边形氮化物/钼异质结构组成的二维晶体管的远程调制掺杂。通过掺杂剂在钨丁烯烯胺表面上的受控电荷转移远程掺杂底层二硫化物通道。通过增加温度降低,调制掺杂装置表现出二维限制的电荷传输和抑制杂质散射。我们的钼二硫化物调节掺杂场效应晶体管表现出60cm(2)V-1 S( - )(1)的室温迁移率;相比之下,已直接掺杂的晶体管表现出35cm(2)V-1 S( - )(1)的迁移率。

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  • 来源
    《Nature Electronics》 |2021年第9期|664-670|共7页
  • 作者单位

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea;

    Kyung Hee Univ Dept Phys Seoul South Korea;

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea;

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea;

    Ulsan Natl Inst Sci & Technol UNIST Dept Mat Sci & Engn Ulsan South Korea;

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea;

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea;

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea;

    Ulsan Natl Inst Sci & Technol UNIST UNIST Cent Res Facil UCRF Ulsan South Korea;

    Kyung Hee Univ Dept Phys Seoul South Korea|Kyung Hee Univ Dept Informat Display Seoul South Korea|Kyung Hee Univ KHU KIST Dept Converging Sci & Technol Seoul South Korea;

    Korea Univ KU KIST Grad Sch Converging Sci & Technol Seoul South Korea|Korea Univ Dept Integrat Energy Engn Seoul South Korea|Korea Inst Sci & Technol Adv Mat Res Div Seoul South Korea;

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