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Implementation of mmWave AlGaN/GaN HEMTs and Power Amplifier MMICs

机译:mmWave AlGaN / GaN HEMT和功率放大器MMIC的实现

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摘要

AlGaN/GaN high electron mobility transistors (HEMT) are designed and fabricated based on 0.15 μm gate-length technology. All source electrodes of multi-finger devices are connected to the through-hole ground instead of using air bridges. Device RF measurements show that they can operate at millimeter wave frequencies. Parasitic and intrinsic parameters of the small signal equivalent circuit model are extracted at reverse cut-off and operating bias state. The revised Angelov expressions are adopted to describe nonlinear characteristics, and the large-signal model is constructed using the symbolically defined device (SDD) method. Using these devices, a two-stage, four-channel monolithic microwave integrated circuit (MMIC) power amplifier is realized with 36 dBm output power, 9 dB power gain and 10 percent power-added efficiency (PAE) at 34 GHz.
机译:AlGaN / GaN高电子迁移率晶体管(HEMT)是基于0.15μm栅长技术设计和制造的。多指设备的所有源电极都连接到通孔接地,而不是使用气桥。器件RF测量表明它们可以在毫米波频率下工作。在反向截止和工作偏置状态下提取小信号等效电路模型的寄生参数和固有参数。采用修正的Angelov表达式描述非线性特征,并使用符号定义设备(SDD)方法构造大信号模型。使用这些设备,可以实现两级,四通道单片微波集成电路(MMIC)功率放大器,在34 GHz时具有36 dBm的输出功率,9 dB的功率增益和10%的功率附加效率(PAE)。

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  • 来源
    《Microwave Journal》 |2015年第2期|949698100|共4页
  • 作者单位

    Beijing Institute of Technology, Beijing, China;

    Beijing Institute of Technology, Beijing, China;

    Beijing Institute of Technology, Beijing, China;

    Beijing Institute of Technology, Beijing, China;

    Hebei Semiconductor Research Institute, Shijiazhuang, China;

    Hebei Semiconductor Research Institute, Shijiazhuang, China;

    Hebei Semiconductor Research Institute, Shijiazhuang, China;

    Hebei Semiconductor Research Institute, Shijiazhuang, China;

    Hebei Semiconductor Research Institute, Shijiazhuang, China;

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  • 正文语种 eng
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