E-beam lithography of computer generated holograms using a fully vectorial 3D beam propagation method

摘要

A fully vectorial 3D beam propagation method (BPM) has been applied to obtain a required pattern of computer generated hologram (CGH) with a variable profile of four phase levels. The computer reconstruction of the CGH image having one and two focal spots was performed by application of the fully vectorial 3D BPM method. After transferring the CGH by EBL technique an adequate phase profile was obtained. Inter-level parameter method was developed to obtain the estimated an electron beam dose required for the even topographical patterning. Using this method, an EBL exposure dose determined to achieve the required relief amplitude of 1.29 urn was 43 μC/cm~2. The manufactured holograms showed that the overall proposed production process, from the 3D BPM computer simulation to e-beam lithography, can be used to obtain good quality product with reasonable time and computational resources.