Development of magnetic nanoactuator systems

摘要

This paper presents the development of mechanically active arrays, which consist of free-standing Ti beam cantilevers with an integrated NiFe cube with critical dimensions of 100 nm allowing for control by an external magnetic field gradient. A process flow is investigated based on two-step electron-beam lithography and reactive ion etching combined with magnetron sputtering of the functional magnetic nanostructures. A sacrificial layer technology is developed for dry etching of Ti anisotropically and Si isotropically at the same time. The saturation magnetization of the deposited NiFe is 0.78 T giving rise of magneto-static forces in order of pN. AFM and MFM measurements confirm the size and position of the magnetic cubes.