Spatial light modulation based 3D lithography with single scan virtual layering

摘要

A novel spatial light modulation based 3D lithography method is proposed to fabricate both 2D and 3D microstructures using a single mechanism. To fabricate multiple layers with a single scan, a virtual layering concept based on super-resolution is devised. To design the hierarchical patterns appropriate to achieve the target irradiation energy determined from the target structure, the single scan virtual layering exposure model is developed. For verification of the proposed method, lithography simulations and experiments were performed to fabricate micro lens array structures. The surface smoothness and uniformity of the fabricated structures reveal that the method is versatile and reliable.