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A review of high-voltage integrated power device for AC/DC switching application

机译:AC / DC交换应用的高压集成功率装置综述

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摘要

High-voltage (HV) integrated power devices are widely used in many applications, including alternating current/direct current (AC/DC) power converter, HV gate driver integrated circuit (IC) and light emitting diode (LED) driver IC, etc. Among these applications, AC/DC power converter is essential for almost all power systems operated in the DC conditions. As a power switch in the AC/DC converter, the fundamental performance requirement of these power devices is to withstand a high voltage of 500-900 V and simultaneously have a low power loss for its efficient conversion. Therefore, several device technologies have been proposed to realize a high breakdown voltage (BV) and a low specific on-resistance (R-on,R- sp), such as reduced surface field (RESURF) technology, lateral super junction (SJ) structure, lateral insulated-gate bipolar transistor (LIGBT), integrated vertical structure and junction termination technology. In this paper, a comprehensive review of the development and prospect of these technologies in AC/DC switching application is presented. Furthermore, analytic R-on,R- sp-BV models for some typical device structures, the possible strategies of Bipolar - Complementary metal oxide semiconductor - Double-diffused metal oxide semiconductor (BCD) platform integrated with vertical SJ devices, partial silicon-on-insulator (SOI) BCD technology, low gate charge (Q(g)) HV integrated power devices and wide bandgap technology are also described.
机译:高压(HV)集成功率器件广泛用于许多应用中,包括交流/直流(AC / DC)功率转换器,HV栅极驱动器集成电路(IC)和发光二极管(LED)驱动器IC等。在这些应用中,AC / DC功率转换器对于在直流条件下操作的几乎所有电力系统都是必不可少的。作为AC / DC转换器中的电源开关,这些功率器件的基本性能要求是承受500-900 V的高电压,同时具有低功耗的功率损耗,以实现其有效转换。因此,已经提出了几种设备技术来实现高击穿电压(BV)和低特定的导通电阻(R-ON,R-SP),例如降低的表面场(RESURF)技术,横向超级结(SJ)结构,横向绝缘栅双极晶体管(LIGBT),集成垂直结构和结终端技术。本文介绍了对AC / DC交换应用中这些技术的开发和前景的全面审查。此外,用于一些典型装置结构的分析R-ON,R-SP-BV型号,双极互补金属氧化物半导体 - 双扩散金属氧化物半导体(BCD)平台与垂直SJ器件,部分硅 - on -Unsulator(SOI)BCD技术,低栅极电荷(Q(g))HV集成功率器件和宽带隙技术。

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  • 来源
    《Microelectronic Engineering》 |2020年第8期|111416.1-111416.11|共11页
  • 作者单位

    Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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