Evaluating the use of MEMS-based gas and fluid delivery systems

摘要

The advent of microelectromechanical systems (MEMS) technology enables dramatic changes in high-purity semiconductor processing. As the industry's manufacturing requirements become increasingly stringent, new technologies must be developed to meet the challenging performance, cost, yield, and reliability specifications of 300-mm wafer manufacturing. Several conventional solutions have been proposed to improve gas and liquid control and distribution systems; only precision MEMS-based systems have the potential to meet and exceed these critical requirements. Silicon microfabricated valves, sensors, and orifices can be integrated to form complex MEMS-based systems for many purposes, including process gas and liquid delivery for dry etch and chemical vapor deposition (CVD) applications.