What do spacecraft design and microlithography have in common? Optics contamination, for starters-as demonstrated at SPIE's recent microlithography symposium, where Alan Tribble, formerly of NASA, and Rod Kunz, of MIT Lincoln Laboratory, offered a well-attended short course entitled "Fundamentals of Photochemical Contamination Control for Lithographic Tools." At first, the two professors seemed like an odd couple. But the combination makes perfect sense.
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机译：航天器设计和微光刻有什么共同点？首先，光学污染是在SPIE最近的微光刻研讨会上所展示的，前美国国家航空航天局（NASA）的艾伦·特里布尔（Alan Tribble）和麻省理工学院林肯实验室（MIT Lincoln Laboratory）的罗德·昆兹（Rod Kunz）提供了题为“光刻工具光化学污染控制基础”的短期课程。最初，两位教授似乎是一对奇怪的夫妇。但是这种结合是完全合理的。
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