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首页> 外文期刊>Micro & Nano Letters, IET >Method for fabricating nanostructures via nanotemplates using dip-pen nanolithography
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Method for fabricating nanostructures via nanotemplates using dip-pen nanolithography

机译:使用浸笔式纳米光刻通过纳米模板制造纳米结构的方法

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Dip-pen nanolithography (DPN) relies on the compatibility between the ink used and the substrate it is written on. This has lead to a significant reliance for DPN on thiol-gold chemistries for the fabrication of nanostructures. This reported work demonstrates a method for creating nanostructures through nanotemplates that allows a wider range of substrates and inks to be used. The substrate was spin-coated with a thin layer of polymer which is selectively removed using a scanning probe microscopy tip coated with a solvent. This produces nanotemplates that are subsequently used to create nanostructures by metallisation. Compared with directly written templates these nanotemplates facilitate longer interaction between inking material and the substrate. They also allow a controlled spatial resolution along the z-axis and eliminate the need for any blocking agents to prevent non-specific adsorption. This method allows DPN to be expanded to applications beyond thiol-gold chemistries.
机译:浸笔式纳米光刻(DPN)依赖于所用墨水与其上书写的基材之间的兼容性。这已导致DPN极大地依赖于硫醇-金化学来制造纳米结构。这项报道的工作展示了一种通过纳米模板创建纳米结构的方法,该方法允许使用更多种类的基材和油墨。用一层聚合物薄层旋涂该基底,该聚合物薄层可使用涂覆有溶剂的扫描探针显微镜头有选择地除去。这产生了纳米模板,其随后被用于通过金属化来创建纳米结构。与直接书写的模板相比,这些纳米模板可促进上墨材料与基材之间的更长距离相互作用。它们还允许沿z轴控制空间分辨率,并且不需要任何阻断剂来防止非特异性吸附。这种方法可使DPN扩展到硫醇金化学以外的应用领域。

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