机译:TaC-20Ni烧结过程中晶粒与液态基体界面的粗糙化
the Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology 305-701 Daejon Korea;
the Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology 305-701 Daejon Korea;
the Department of Materials Science and Engineering University of Wisconsin-Madison 53706 Madison WI;
the Korea Institute of Science and Technology 136-791 Seoul Korea;
机译:TaC〜20Ni烧结过程中晶粒与液相基体界面的粗糙化
机译:WC-Co合金液相烧结过程中晶粒运动对碳饱和液态基体中WC晶粒粗化的影响
机译:非刻面边界的晶界界面粗糙化过渡及其对晶界迁移率的影响
机译:烧结添加剂组成对液相烧结碳化硅晶粒边界结构的影响
机译:液相烧结中的三维晶粒尺寸分布和晶粒结构重构。
机译:用粗粒分子动力学在液-液界面上探测肽纳米管的自组装。
机译:实体al的小液体Pb夹杂物平衡形状和界面粗糙化