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Grain boundary interface roughening transition and its effect on grain boundary mobility for non-faceting boundaries

机译:非刻面边界的晶界界面粗糙化过渡及其对晶界迁移率的影响

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摘要

Like other interfaces, equilibrium grain boundaries are smooth at low temperature and rough at high temperature; however, little attention has been paid to roughening except for faceting boundaries. Using molecular dynamics simulations of face-centered cubic Ni, we studied two closely related grain boundaries with different boundary planes. In spite of their similarity, their boundary roughening temperatures differ by several hundred degrees, and boundary mobility is much-larger above the roughening temperature. This has important implications for microstructural development during metallurgical processes.
机译:像其他界面一样,平衡晶界在低温下是光滑的,而在高温下是粗糙的。然而,除了刻面边界之外,几乎没有关注粗糙化。使用面心立方镍的分子动力学模拟,我们研究了具有不同边界平面的两个紧密相关的晶界。尽管它们具有相似性,但它们的边界粗糙化温度相差数百度,并且边界迁移率比粗糙化温度高得多。这对冶金过程中的微结构发展具有重要意义。

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