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首页> 外文期刊>Materials Transactions >Behaviour of Bombarded Ar at Surface and Bonded Interface of Copper
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Behaviour of Bombarded Ar at Surface and Bonded Interface of Copper

机译:轰击Ar在铜的表面和键合界面处的行为

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摘要

Argon ion bombardment is known to be effective in removing all surface contaminations and oxides and improving the quality of diffusion bonds. However, recent work has shown that the accelerating voltage used during the ion bom- bardment significantly affected the bond strength. This work has been carried out to investigate the behaviour of argon at the surface and bonded copper interface After argon ion bombardment. To investigate changes at the surface and the bonded interface, surface composition, Surface morphology, gas in voids at the interface were monitored using Auger spectroscopy, reflection high energy elec- Tron diffraction (RHEED), and mass spectroscopy.
机译:已知氩离子轰击可有效去除所有表面污染物和氧化物并改善扩散键的质量。但是,最近的工作表明,离子轰击过程中使用的加速电压会显着影响键合强度。进行这项工作以研究氩离子轰击后氩在表面和键合铜界面上的行为。为了研究表面和键合界面的变化,使用俄歇光谱,反射高能电子衍射(RHEED)和质谱法监测了表面组成,表面形态,界面空隙中的气体。

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