...
首页> 外文期刊>Materials science forum >Microstructural and Dielectric Properties of SrTiO_3-doped CaCu_3Ti_40_(12) Ceramics
【24h】

Microstructural and Dielectric Properties of SrTiO_3-doped CaCu_3Ti_40_(12) Ceramics

机译:SrTiO_3掺杂CaCu_3Ti_40_(12)陶瓷的微结构和介电性能

获取原文
获取原文并翻译 | 示例
           

摘要

CaCu_3Ti_40_(12) presents colossal dielectric permittivity within a large temperature and frequency range, which makes it to be a suitable material for technological applications, such as components of capacitive memories and mobile phones. In this investigation, SrTiO_3-doped CaCu_3Ti_40_(12) ceramics were prepared by solid-state reaction. The influence of doping on the structures, compositions and dielectric properties of the materials were investigated by X-ray diffraction, scanning electron microscopy and dielectric measurements between 40 Hz and 110 MHz. The material presents colossal response (ε_r~10~4-10~5) and the dielectric loss tangent decreased with doping level increase at high frequency. The microstructure analysis showed that the second-phase particles segregated in the doped CaCu_3Ti_4O_(12) grain edges. Cole-Cole modeling correlated well the effects of this segregation with the relaxation parameters obtained. The extrinsic contributions for the dielectric response were discussed together with the structural and compositional evolution of SrTiO_3-doped CaCu_3Ti_40_(12) material. The experimental results indicated that SrTiO_3 doping is a suitable method to optimize the dielectric response and electrical properties of CaCu_3Ti_40_(12) for the applications in microelectronic devices.
机译:CaCu_3Ti_40_(12)在较大的温度和频率范围内呈现出巨大的介电常数,这使其成为适合诸如电容式存储器和移动电话等技术应用的材料。在这项研究中,通过固相反应制备了SrTiO_3掺杂的CaCu_3Ti_40_(12)陶瓷。通过X射线衍射,扫描电子显微镜和40 Hz至110 MHz之间的介电测量,研究了掺杂对材料结构,组成和介电性能的影响。该材料呈现出巨大的响应(ε_r〜10〜4-10〜5),并且随着高频掺杂水平的提高,介电损耗角正切值减小。显微组织分析表明,第二相颗粒偏析在掺杂的CaCu_3Ti_4O_(12)晶粒边缘。 Cole-Cole建模将这种分离的效果与获得的松弛参数很好地相关。讨论了介电响应的外在贡献以及SrTiO_3掺杂的CaCu_3Ti_40_(12)材料的结构和组成演变。实验结果表明,SrTiO_3掺杂是优化CaCu_3Ti_40_(12)的介电响应和电学性能的合适方法,适用于微电子器件。

著录项

  • 来源
    《Materials science forum》 |2011年第2011期|p.321-326|共6页
  • 作者单位

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    College of Physics and Information Technology, Shaanxi Normal University, Xi'an 710062, China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    cacu_3ti_40_(12); dielectric properties; impedance;

    机译:cacu_3ti_40_(12);介电性能阻抗;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号