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Surface modification or doping of WO_3 for enhancing the photocatalytic degradation of organic pollutant containing wastewaters: A Review

机译:WO_3的表面改性或掺杂以增强光催化降解含有机污染物的废水的研究进展

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摘要

Tungsten trioxide (WO_3) is an oxygen deficient metal oxide and well known semiconductor with a small band gap of between 2.4 and 2.8 eV. It is also used as a photo-catalyst for degradation of organic pollutants present in aqueous environment. It has stable physico-chemical properties and shows strong absorption of solar spectrum and thus can be used in visible-light driven photocatalysis. WO_3 has a conduction band (E_(CB)) of +0.4 V versus NHE (normal hydrogen electrode) at pH = 0. Therefore, pure WO_3 has lower light energy conversion efficiency as compared to other widely used photocatalysts such as zinc oxide (ZnO) and titanium oxide (TiO_2). This is because the reduction potential of the electrons in WO_3 is low due to its low conduction band level. O_2 cannot be efficiently trapped in the conduction band electrons to yield superoxide radicals and fast recombination of charge carriers takes place resulting in lesser photocatalytic activity of WO_3. However, holes in the valence band (E_(VB) = +3.1 V) are energetically favorably situated to oxidize water to hydrogen. To modify the energy band position and reduce the charge carrier recombination, doping or surface modification of WO_3 is necessary. This review article demonstrates the effect of dopants (low band semiconductor catalyst) on the surface modification of WO_3 to enhance the photo catalytic activity which helps in degradation of the organic pollutants present in the wastewater.
机译:三氧化钨(WO_3)是一种缺氧金属氧化物,是众所周知的半导体,其带隙在2.4到2.8 eV之间。它也被用作降解水环境中存在的有机污染物的光催化剂。它具有稳定的物理化学性质,并显示出对太阳光谱的强吸收性,因此可用于可见光驱动的光催化。与pH = 0的NHE(普通氢电极)相比,WO_3的导带(E_(CB))为+0.4V。因此,与其他广泛使用的光催化剂(例如氧化锌(ZnO))相比,纯WO_3的光能转换效率较低。 )和二氧化钛(TiO_2)。这是因为WO_3中电子的还原电位由于其低的导带能级而低。 O_2不能被有效地捕获在导带电子中以产生超氧化物自由基,并且电荷载流子的快速重组发生,导致WO_3的光催化活性降低。然而,价带(E_(VB)= +3.1 V)上的空穴在能量上有利地位于将水氧化成氢的位置。为了改变能带位置并减少电荷载流子复合,WO_3的掺杂或表面修饰是必需的。这篇综述文章证明了掺杂剂(低能带半导体催化剂)对WO_3的表面改性的作用,以增强光催化活性,从而有助于废水中有机污染物的降解。

著录项

  • 来源
    《Materials science forum》 |2016年第2016期|105-126|共22页
  • 作者单位

    Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, Uttarakhand, India,Institute of Environmental Engineering, National Taiwan University, Taipei 10673, Taiwan, ROC;

    Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, Uttarakhand, India;

    Institute of Environmental Engineering, National Taiwan University, Taipei 10673, Taiwan, ROC;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Tungsten trioxide; doping; OH radicals; surface modification; band gap energy;

    机译:三氧化钨;掺杂OH基;表面改性;带隙能量;
  • 入库时间 2022-08-17 23:46:40

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