...
首页> 外文期刊>Materials science forum >Microstructure of Chemical Vapor Transport Deposition Single Crystal Tungsten Coating Working at 1600℃
【24h】

Microstructure of Chemical Vapor Transport Deposition Single Crystal Tungsten Coating Working at 1600℃

机译:1600℃化学气相沉积单晶钨涂层的显微组织

获取原文
获取原文并翻译 | 示例

摘要

Thermionic energy conversion is a process by which thermal energy is transformed into electrical energy directly without the intermediate steps. Microstructure of Chemical Vapor Transport Deposited (CVTD) single crystal tungsten coating working at 1600℃ for 1000 h was investigated using optical microscopy and electron backscatter diffraction (EBSD) technique. The experimental results showed that the etching morphology of single crystal tungsten coating was not clear compared to the etching morphology before working. The electro-etched surface of single crystal tungsten coating mainly consist of {110} crystal planes and {112} crystal planes before working at 1600℃. The surface of the single crystal tungsten coating mainly consists of near {110} crystal planes and near {112} crystal planes instead after working at 1600℃.
机译:热电子能量转换是通过该过程将热能直接转换为电能而无需中间步骤的过程。利用光学显微镜和电子背散射衍射(EBSD)技术研究了化学气相沉积(CVTD)单晶钨涂层在1600℃下工作1000小时的微观结构。实验结果表明,单晶钨涂层的腐蚀形态与加工前的腐蚀形态相比并不清晰。单晶钨涂层的电蚀表面在1600℃工作之前主要由{110}晶面和{112}晶面组成。在1600℃下加工后,单晶钨涂层的表面主要由接近{110}晶面和接近{112}晶面组成。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号