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机译:1600℃化学气相沉积单晶钨涂层的显微组织
Department of Reactor Engineering Research and Design, China Institute of Atomic Energy, Beijing 102413 China;
Department of Reactor Engineering Research and Design, China Institute of Atomic Energy, Beijing 102413 China;
Department of Reactor Engineering Research and Design, China Institute of Atomic Energy, Beijing 102413 China;
School of Material Science, Beijing Institute of Technology, Beijing 100081 China;
Thermionic energy converter; CVTD; Single crystal tungsten coating; Etching morphology;
机译:通过化学气相传输沉积在钨单晶涂层上
机译:通过化学蒸汽输送沉积实现的钨单晶涂层
机译:化学气相传输对钨单晶层沉积温度的影响
机译:化学蒸汽运输沉积的微晶钨涂层在1600°C工作
机译:通过化学气相沉积法在单晶镍基高温合金上合成α-氧化铝和氟化氢掺杂的β-镍铝化物涂层。
机译:化学气相沉积法制备纳米晶TiB2薄膜的微观结构
机译:厚钨涂层的化学气相沉积:拉曼测量和质量传递模型
机译:单晶硅上LpCVD(低压化学气相沉积)钨膜隧道形成条件