首页> 外文期刊>Materials Science and Engineering >Josephson coupling in high-T_c superconducting junctions using ultra-thin BaTiO_3 barriers
【24h】

Josephson coupling in high-T_c superconducting junctions using ultra-thin BaTiO_3 barriers

机译:Josephson在使用超薄BATIO_3屏障的高T_C超导结中耦合

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

We study the electrical transport of vertically-stacked Josephson tunnel junctions using GdBa_2Cu_3O_(7-δ) electrodes and a BaTiO_3 barrier with thicknesses between 1 nm and 3 nm. Current-voltage measurements at low temperatures show a Josephson coupling for junctions with BaTiO_3 barriers of 1 nm and 2 nm. Reducing the barrier thickness bellow a critical thickness seems to suppress the ferroelectric nature of the BaTiO_3. The Josephson coupling temperature reduces as the barrier thicknesses increases. The Josephson energies at 12 K are of ≈ 1.5 mV and ≈ 7.5 mV for BaTiO_3 barriers of 1 nm and 2 nm, respectively. Fraunhofer patterns are consistent with fluctuations in the critical current due to structural inhomogeneities in the barriers. Our results are promising for the development of Josephson junctions using high-T_c electrodes with energy gaps much higher than those usually present in conventional low-temperature superconductors.
机译:我们使用GDBA_2CU_3O_(7-δ)电极和BATIO_3屏障在1nm和3nm之间的厚度的厚度研究垂直堆叠的Josephson隧道结的电气传输。低温下的电流电压测量显示了与1nm和2nm的BATIO_3屏障的结的Josephson耦合。减少屏障厚度偏向临界厚度似乎抑制了BATIO_3的铁电性质。随着阻挡厚度的增加,Josephson耦合温度降低。 12 k的约瑟夫森能量分别为12 k的≈1.5mV,分别为1nm和2nm的Batio_3屏障的≈1.5mV。 Fraunhofer模式符合由于屏障中结构不均匀的临界电流波动。我们的结果是利用高T_C电极开发Josephseon结的开发,其能量差距远高于通常存在于传统的低温超导体中的能量差距。

著录项

  • 来源
    《Materials Science and Engineering》 |2020年第12期|114714.1-114714.6|共6页
  • 作者单位

    Instituto Balseiro Universidad National de Cuyo and Comision National de Energia Atomica Av. Bustillo 9500 8400 San Carlos de Bariloche Argentina;

    Instituto Balseiro Universidad National de Cuyo and Comision National de Energia Atomica Av. Bustillo 9500 8400 San Carlos de Bariloche Argentina Comision National de Energia Atomica and Consejo National de Investigaciones Cientificas y Tecnicas Centro Atomico Bariloche Av. Bustillo 9500 8400 San Carlos de Bariloche Argentina;

    Department of Physics Pohang University of Science and Technology Pohang 37673 Republic of Korea Advanced Material Science Pohang University of Science and Technology Pohang 37673 Republic of Korea Max Planck POSTECH Center for Complex Phase Materials Pohang University of Science and Technology Pohang 37673 Republic of Korea;

    Instituto Balseiro Universidad National de Cuyo and Comision National de Energia Atomica Av. Bustillo 9500 8400 San Carlos de Bariloche Argentina Comision National de Energia Atomica and Consejo National de Investigaciones Cientificas y Tecnicas Centro Atomico Bariloche Av. Bustillo 9500 8400 San Carlos de Bariloche Argentina;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Josephson junctions; High-T_c superconductors; Thin films;

    机译:约瑟夫森交汇处;高T_C超导体;薄膜;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号