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Preparation of monolithic AlN and composite TiN-AlN powders and films from precursors synthesized by electrolysis

机译:电解合成前驱体制备单片AlN和TiN-AlN复合粉末和薄膜

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摘要

Aluminum nitride (AlN) and TiAlN precursor solutions were synthesized by room temperature galvanostatic electrolysis of Al metal and Ti-Al alloy, respectively, in isopropyl-amine at a current density of 50 mA cm~(-2). Monolithic AlN and composite TiAlN powders were prepared from these precursors by two-stage heat treatment at 400℃ in Ar and at 1200℃ in NH_3. Nitride films were produced by dip-coating and two-stage heat treatment of the precursor solution on silica glass substrates. The precursor solution used for the film preparation was concentrated from one-third to one-seventh by volume. The powders and films were characterized by XRD, chemical analysis, XPS and SEM/TEM observation in terms of phase evolution, particle size, film thickness and impurity content. The AlN and TiN-AlN films prepared from the concentrated precursor were smooth and flat, and were composed of uniform grains less than 100 nm in size.
机译:通过在异丙基胺中以50 mA cm〜(-2)的电流密度分别对Al金属和Ti-Al合金进行室温恒电流电解来合成氮化铝(AlN)和TiAlN前体溶液。由这些前体通过在Ar中400℃和NH_3中1200℃的两阶段热处理制备了整体AlN和TiAlN复合粉末。通过在石英玻璃基板上浸涂前驱体溶液并对其进行两阶段热处理来生产氮化膜。用于膜制备的前体溶液按体积计从三分之一浓缩至七分之一。通过X射线衍射,化学分析,XPS和SEM / TEM观察对粉末和薄膜进行了表征,包括相变,粒度,膜厚和杂质含量。由浓缩的前体制备的AlN和TiN-AlN膜是光滑且平坦的,并且由尺寸小于100nm的均匀晶粒组成。

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