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首页> 外文期刊>Materials Science and Engineering. B, Solid-State Materials for Advanced Technology >Substrate bias effects on mechanical and tribological properties of substitutional solid solution (Ti, Al)N films prepared by reactive magnetron sputtering
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Substrate bias effects on mechanical and tribological properties of substitutional solid solution (Ti, Al)N films prepared by reactive magnetron sputtering

机译:衬底偏压对反应磁控溅射制备固溶体(Ti,Al)N替代膜的力学和摩擦学性能的影响

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摘要

Nitrogen-saturated solid solution titanium-aluminium-nitride (Ti, Al)N thin films were deposited onto Si(100) wafers (for concentration and mechanical analyses) and AISI M42 tool steels (for tribological measurements) at room temperature by reactive close-field unbalanced magnetron sputtering in an Ar-N_2 gas mixture. The effects of substrate negative bias voltages (U_b) on the mechanical and tribological properties of these films have been studied. These films were characterized and analyzed by high-resolution transmission electron microscopy (HRTEM), scanning electron microscope (SEM), atomic force microscope (AFM), nanoindentation measurements, an optical interference method, Rockwell-C tester, scratch tester, impact tester and ball-on-disc tribometer. It was found that the hardness, residual stress, surface roughness and aluminium concentration of the films were clearly correlated. The hardness and residual stress of the films were increased from 29.6 to 39.0 GPa and from 2.8 to 6.6 GPa, whereas the surface roughness and the fraction of aluminium concentration [Al/(Ti + Al)] were decreased from 12.2 to 6.8 nm and from 0.48 to 0.27 nm, respectively, by increasing U_b from -10 to -100 V. For the tribological measurements, the sliding performance of the films against three different counter balls (steel, Al_2O_3 and WC) was evaluated and compared. It was generally observed that the wear rates decreased with increasing U_b. The friction coefficients of the films on the Al_2O_3 balls were measured to be the highest at ~1.1, whereas the friction coefficients of the films on the steel balls were the lowest at ~0.5. In the dynamic impact resistance tests, the films prepared at U_b of -60, -70 and -80 V showed very good performance, whereas the film prepared at U_b of -80 V exhibited the best impact resistance, showing that the coatings endured impact cycles of 4 x 10~5 before failure occurred. These adhesive properties and wear performance of solid solution (Ti, Al)N films under different bias conditions were explained on the basis of microstructure, mechanical properties and wear mechanisms.
机译:氮饱和固溶氮化钛铝(Ti,Al)N薄膜在室温下通过活性密闭法沉积在Si(100)晶片(用于浓度和机械分析)和AISI M42工具钢(用于摩擦学测量)上-N_2气体混合物中的磁场不平衡磁控溅射。研究了衬底负偏压(U_b)对这些薄膜的机械和摩擦学性能的影响。通过高分辨率透射电子显微镜(HRTEM),扫描电子显微镜(SEM),原子力显微镜(AFM),纳米压痕测量,光学干涉法,罗克韦尔C测试仪,划痕测试仪,冲击测试仪和透射电子显微镜对这些薄膜进行表征和分析圆盘式摩擦计。发现膜的硬度,残余应力,表面粗糙度和铝浓度明显相关。膜的硬度和残余应力从29.6 GPa增加到39.0 GPa,从2.8 GPa增加到6.6 GPa,而表面粗糙度和铝浓度的分数[Al /(Ti + Al)]从12.2降低到6.8 nm,从通过将U_b从-10 V增加到-100 V,分别将其提高到0.48至0.27 nm。对于摩擦学测量,评估并比较了膜对三种不同的反向球(钢,Al_2O_3和WC)的滑动性能。通常观察到,磨损率随U_b的增加而降低。 Al_2O_3球上的膜的摩擦系数最高为〜1.1,而钢球上的膜的摩擦系数最低为〜0.5。在动态抗冲击性测试中,以-60,-70和-80 V的U_b制备的膜表现出非常好的性能,而以-80 V的U_b制备的膜表现出最佳的抗冲击性,表明涂层经受了冲击循环发生故障前的4 x 10〜5从微观结构,力学性能和磨损机理出发,对固溶(Ti,Al)N薄膜在不同偏压条件下的粘接性能和耐磨性能进行了解释。

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