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首页> 外文期刊>Materials Science and Engineering. B, Solid-State Materials for Advanced Technology >I-V anomalies on InAlAs/InGaAs/InP HFETs and deep levels investigations
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I-V anomalies on InAlAs/InGaAs/InP HFETs and deep levels investigations

机译:InAlAs / InGaAs / InP HFET的I-V异常和深层调查

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In this paper, static measurements and defect analysis performed on InAlAs/InGaAs/InP HFETs are presented. I_d-V_(ds)-T, I_d-V_(gs)-T and I_g-V_(gs)-T characteristics show anomalies (leakage current, degradation in saturation current, kink effect, distortions on I_d-V_d characteristics in saturation region after high voltage application, ...). Deep defects analysis performed by means of capacitance transient spectroscopy (C-DLTS) and frequency dispersion of the output conductance (G_(ds)(f)) prove the presence of deep defects with activation energies ranging from 0.12 to 0.75 eV. The presence of generation-recombination centers, acting like traps, is confirmed by I_g-V_(gs). The localization and the identification of these defects are presented. Finally, the correlation between the anomalies observed on output characteristics and defects is discussed.
机译:本文介绍了在InAlAs / InGaAs / InP HFET上进行的静态测量和缺陷分析。 I_d-V_(ds)-T,I_d-V_(gs)-T和I_g-V_(gs)-T特性显示异常(漏电流,饱和电流降低,扭结效应,饱和区域中I_d-V_d特性的失真施加高压后,...)。通过电容瞬态光谱法(C-DLTS)和输出电导的频率色散(G_(ds)(f))进行的深层缺陷分析证明,存在深层缺陷,其活化能范围为0.12至0.75 eV。 I_g-V_(gs)证实了像陷阱一样起作用的世代重组中心的存在。介绍了这些缺陷的定位和识别。最后,讨论了观察到的输出特性异常与缺陷之间的相关性。

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