Electrical characterization of 6H-SiC grown by physical vapor transport method

摘要

Deep level transient spectroscopy (DLTS) and capacitance versus voltage (C-V) measurements have been used to study the electrical properties of electron traps in n-type 6H-silicon carbide (SiC) grown by physical vapor transport (PVT) technique, designed as Schottky diodes. Ir Schottky- and Ni ohmic-contacts were deposited by sputtering. Current versus voltage (I-V) measurements showed that sputter deposition of the Schottky contact yields diodes with a reduced barrier height and poor rectification characteristics. Four main electron traps revealed in DLTS spectra have activation energies at 0. 39,0.41,0,66, and 0.74 eV below the conduction band. Based on a comparison made with electron traps reported in the literature, we conclude that three of them are well-known traps found in the as-grown or irradiated material. There was no emission signature in the literature to make such a correspondence for the trap at 0.74 eV. Strongly nonhomogenous spatial distribution with a tendency of the trap to accumulation at the surface was found by DLTS and C-V profiling. This together with the fact that the trap at 0.74eV has not been previously reported in as-grown or processed material makes it possible that the trap is sputter deposition induced defect.